A-Star Photonics について
A-Star Photonics は、中国/福州に本社を置く、光学部品、結晶材、高精度光学機器等に注力するメーカーです。
当社はA-Star Photonicsの代理店です。
ラインナップ
Crystal
BBO Crystal
用途
- レーザークリスタル
- NOPAクリスタル他
仕様
Flank Size(W*H) | 1×1~25×25 |
---|---|
Length(L) | 0.005~25mm |
Phase Matching Angle(θ,φ) | Angel or according to customer request |
Match Type | type I or type II |
Angle Tolerance | Δθ<±0.2°; Δφ<±0.2° |
Size Tolerance | (W ±0.1mm) x (H ±0.1mm) x (L +0.2mm/-0.1mm) |
Flatness | <λ/8 @ 633nm |
Smooth Finish | 20/10 |
Parallelism | <30″ |
Perpendicularity | <10′ |
Wavefront Distortion | <λ/8 @ 633nm |
Clear Aperture | > 90% |
Coating | P-coating or according to customer request |
LBO Crystals
用途
- 超高速 Ti:sapphireレーザー
- 光学パラメータ式発振器
- 光パラメトリック増幅器他
特性
Crystal Structure | Orthorhombic, mm2 |
---|---|
Cell Parameters | a = 8.4473, b = 7.3788Å, c = 5.1395Å, Z = 2 |
Melting point | 834°C |
Optical homogeneity | d n ~ 10-6/cm |
Mohs hardness | 6 |
Density | 2.47 g/cm3 |
Absorption coefficient | < 0.1%/cm (at 1064nm and 532nm) |
Specific heat | 1.91J/cm3xK |
Hygroscopic susceptibility | low |
Thermal expansion coefficients | a, 4 x 10-6/K; c, 36 x 10-6/K |
Thermal conductivity | ^ c, 1.2 W/m/K; //c, 1.6 W/m/K |
LiNbO3 & MgO:LiNbO3
用途
- ポッケルセル
- Qスイッチ
- 位相変調器
- 弾性表面波(SAW)ウエハー
特性
Crystal Structure | Trigonal, space group R3c |
---|---|
Cell Parameters | a=0.515,c=13.863,Z=6 |
Melting Point | 1255 +/-5℃ |
Curie Point | 1140 +/-5℃ |
Mohs Hardness | 5 |
Density | 4.64 g/cm 3 |
Absorption Coefficient | ~ 0.1%/cm @ 1064 nm |
Solubility | insoluble in H2O |
Relative Dielectric Constant | εT11/ε0: 85 εT33/ε0:29.5 |
Thermal Expansion Coefficients at 25℃ |
||a, 2.0 x 10 -6/K @ 25℃ ||c, 2.2 x 10 -6/K @ 25℃ |
Thermal Conductivity | 38 W /m /K @ 25℃ |
DKDP&KDP
特徴
- 優れた UV透過
- 高い光学損傷閾値
- 優れた複屈折及び非線形係数
用途
- 高出力レーザー 周波数変換物質
- 高速写真撮影用シャッター
- 電気工学変調機及びQスイッチ他、
KD*P Single A-STAR— Standard
Designation | Operation | Input | Output |
---|---|---|---|
53.7° | SHG (II) | 1064 nm | 532 nm |
59.5° | THG (II) | 1064 nm + 532 nm | 355 nm |
86° | FHG (I) angle tune | 532 nm | 266nm |
90° | FHG (I) temp. tune | 532 nm | 266 nm |
Wavefront distortion | less than l/8 @ 633nm |
---|---|
Dimension tolerance | (W± 0.1mm) x (H±0.1mm) x (L + 0.2mm/-0.1mm) |
Clear aperture | > 90% central area |
Flatness | l/8 @ 633nm |
Scratch/Dig code | 10/5 to MIL-O-13830A |
Parallelism | better than 20 arc seconds |
P erpendicularity | 5 arc minutes |
Angle tolerance | Dq <± 0.3°, Df <±0.3° |
Quality Warranty Period | one year under proper use |
KTP
特徴
- 大きな 非線形光学係数
- 幅広い温度及びスペクトラル帯域幅
- 高電気工学係数及び低い誘電率
- 非吸湿性、優れた化学及び機械的特性
用途
- Nd-ドープレーザー(緑・赤色出力)の周波数倍増
- Ndレーザー及びレーザーダイオード(青色出力)の周波数混合
- 0.6mm-4.5mm 可変出力の為のパラメトリック源(OPG, OPA and OPO)
- E-O 変調機、光学スイッチ、方向性結合器他、
ATTRIBUTE | COMMERCIAL | HIGH PRECISION |
---|---|---|
Wavefront Distortion | λ/8 | λ/8 |
Orientation | ±0.5° | ±0.2° |
Dimension Tolerance | ±0.1mm | ±0.01mm |
End-faces Configuration | Flat | |
Surface Quality | 20-10 scratch and dig | 0-5 scratch and dig |
Flatness | λ/8 | λ/10 |
Parallelism | 20″ | 10″ |
Intrinsic Loss | 50ppmcm-1@ 1064nm |
KTA Crystal
特徴
- 幅広い温度及びスペクトラル帯域幅
- 低誘電率、低損失係数、イオン伝導率
- 高い損傷閾値
用途
- 周波数倍増 (SHG @1083nm-3789nm)
- 和周波数及び差周波数(SFG)/(DFG)他
KTA Crystal Specification | |
---|---|
Dimension Tolerance | ±0.1mm |
Flatness | <λ/8 @633nm |
Surface Quality | 10/5 Scratch/Dig |
Parallelism | better than 30 arc sec. |
Perpendicularity | better than 30 arc min |
Angle Tolerance | △q < 0.5°,△f < 0.5° |
AR Coating | AR coatings |
Clear Aperture | >90% central area |
Transmitting Wave front Distortion | less than l/8 @ 633nm |
Nd:YAG
用途
- レーザー媒体(個体レーザー)
仕様
Nd Dopant Concentration | 0.5-1.2 atm%tolerance within 10% of concentration |
---|---|
Diameter | 3 ~ 14mm |
Length(L) | 0.5~160mm |
Orientation | <111> crystalline direction (+/-0.5℃) |
Flatness | <λ/8 @ 633nm |
Smooth Finish | 20/10 |
Parallelism | <30″ |
Perpendicularity | <10′ |
Wavefront Distortion | < λ/8 @ 633nm |
Clear Aperture | > 90% |
Coating | According to customer request |
Optical Components
平凸レンズ(plano-convex lenses)
仕様
Material | BK7, Fused Silica, SF10, CaF2, Sapphire .etc. |
---|---|
Paraxial Focal Length Tolerance | ±2% |
Dimension Tolerance | ±0.2(General). ±0.05(High Precision) |
Centration | <3 arc min |
IRR | λ/4@633nm(General),λ/10@633nm(High Precision) |
Clear Aperture | >80%(Small Size), >95%(Large Size) |
Surface Figure | <1.5λ@633nm(General),<λ/4@633nm(High Precision) |
Surface Quality | 60/40(General),10/5(High Precision) |
Bevel | <0.25mm |
Coating | Uncoated, AR,PR, HR, etc. |
平凹レンズ(plano-concave lenses)
用途
- 焦点距離増大(既存システム)
仕様
Material | BK7, Fused Silica, SF10, CaF2, Sapphire .etc. |
---|---|
Paraxial Focal Length Tolerance | ±2% |
Dimension Tolerance | ±0.2(General). ±0.05(High Precision) |
Centration | <3 arc min |
IRR | λ/4@633nm(General),λ/10@633nm(High Precision) |
Clear Aperture | >80%(Small Size), >95%(Large Size) |
Surface Figure | <1.5λ@633nm(General),<λ/4@633nm(High Precision) |
Surface Quality | 60/40(General),10/5(High Precision) |
Bevel | <0.25mm |
Coating | Uncoated, AR,PR, HR, etc. |
Achromatic Double Lens
用途
- 有色及び球面収差効果の制限
仕様
Material | BK7 glass and ZF2 or ZF4 |
---|---|
EFL | +/- 2% |
Diameter | +0, -0.18 |
Center thickness tolerance | +/- 0.20 |
Surface quality | 40/20 scratch/dig |
Centeration | 2 arc minimum |
Cylindrical Lens
用途
- バーコードスキャニング
- レーザー計測システム
- ホログラフィ
Material | BK7(H-K9L), fused silica(JGS1),SF10(H-ZF13) |
---|---|
Surface Figure | λ /2@633nm on plano side |
Surface Quality | 60/40 Scratch/Dig |
Dimension Tolerance | + 0.0mm, – 0.1mm |
Thickness Tolerance | ± 0.2mm |
Chamfer | 0.25mm at 45° typical |
Concentricity | 3 minutes |
Focal Length Tolerance | ± 1% typical |
Antireflection Coating | Wavelength user specified |
R 0.25% for V-type AR coating | |
R 0.5% for BBAR coating, per surface. | |
Clear Aperture | Exceeds central 85% of dimension |
偏光光学(Polarization Optics)
ローオーダー波長板(Low Order Waveplate)
シングルプレートローオーダー波長板
仕様
Material | Quartz |
---|---|
Dimension Tolerance | +0.0/-0.1mm |
Surface Quality | 20/10 |
Flatness | λ/8@633nm |
Parallelism | <1 arc Second |
Retardation Tolerance | λ/300 |
Clear Aperture | >90% |
AR Coated | R <0.2%@Wavelength |
Standard WaveLength | 266nm,355nm,532nm,63.28nm,780nm,808nm, 850nm,980nm,1064nm,1310nm,1480nm,1550nm |
ゼロオーダー波長板(Zero Order Waveplate)
仕様
Attribute | Specification |
---|---|
Material | Quartz |
Dimension Tolerance | +0.0/-0.1mm |
Surface Quality | 20/10 Scratch/Dig |
Flatness | λ/8@633nm |
Parallelism | <1 arc Second |
Retardation Tolerance | λ/500 |
Clear Aperture | >90% |
AR Coated | R <0.2%@Wavelength |
Standard Wavelength | 266nm,355nm,532nm,63.28nm,780nm,808nm, 850nm,980nm,1064nm,1310nm,1480nm,1550nm |
デュアルウェイブレングス波長板(Dual wavelength Waveplate)
Dual Wavelength Waveplate
仕様
Material | Quartz |
---|---|
Dimension Tolerance | +0.0/-0.1mm |
Surface Quality | 20/10 |
Flatness | λ/8@633nm |
Parallelism | <1 arc Second |
Retardation Tolerance | λ/300 |
Clear Aperture | >90% |
AR Coated | R <0.2%@Wavelength |
Standard WaveLength | 800nm&400nm,1064nm&532nm, |
Lens Assembly
レンズアッセンブリ(Lens Assembly)
カスタム化にも対応し、顧客ニーズに応じ、設計及び製造が可能です。
lens assemblies Types | Optical Assemblies, lens assembly |
---|---|
Lens Assembly | |
Precision Optics Assembly (Supply mounting for various Crystals, Beamsppliers, ,Polarizers, Waveplates etc.) |
|
Other Lenses Assembly (OEM ) |