FOCtek Photonicsについて
FOCtek Photonicsは、2002年に中国/福建省・福州市で設立された。光学・結晶部品のメーカーです。
光学部品の製造・組み立てを主事業とし、レンズ(カスタム品)、ビームスプリッター、プリズム等を販売しています。
当社はFoctek Photonicsの代理店です。
RoHSとREACHに準拠しています。
::FOCtek Photonicsの製品一覧はOptishopまで
レーザー結晶
Nd:YVO4
代表的仕様及び許容値
Orientation |
a-cut crystalline direction(+/-0.20) |
Dimensional tolerance |
+/-0.1mm(typical)High precision +/-0.005mm can be available upon request. |
Wavefront Distortion |
<l/8@633nm |
Surface quality |
better than 20/10 Scratch/Dig per MIL-O-1380A |
Parallelism |
< 10 arc seconds |
Perpendicularity |
< 5 arc minutes |
Surface flatness |
<l/10 at 632.8nm |
Clear aperture |
Central 95% |
Chamfer |
0.15×450 |
Damage threshold |
over 15J/cm2 (rods without coating) over 700 MW/cm2 (coating) |
Coating |
(1) AR@1064nm, R< 0.1% (see coating 6-1) |
(2) AR@1064nm, R< 0.1% & HT@808nm, T>95% (see coating 6-2) |
(3) HR@1064nm, R>99.8% & HT@808nm, T>95%(see coating 6-3) |
(4) HR@1064nm, R>99.8%, HR@532 nm, R>99% & HT@808 nm, T>95%(see coating 6-4) |
(5) AR@1064 nm, R<0.1%, AR@532NM, R<0.3%(see coating 6-5) |
Nd:GdVO4
代表的仕様及び許容値
Orientation |
a-cut crystalline direction(+/-0.20) |
Dimensional tolerance |
+/-0.1mm(typical)High precision +/-0.005mm can be available upon request. |
Wavefront Distortion |
<l/8@633nm |
Surface quality |
better than 20/10 Scratch/Dig per MIL-O-1380A |
Parallelism |
< 10 arc seconds |
Perpendicularity |
< 5 arc minutes |
Surface flatness |
<l/10 at 632.8nm |
Clear aperture |
Central 95% |
Chamfer |
0.15×450 |
Damage threshold |
over 15J/cm2 (rods without coating) over 700 MW/cm2 (coated) |
Coating |
1)AR@1063nm, R< 0.1% & HT@808nm, T>95%(see coating 3-1 ) |
2)HR@1063nm, R>99.8% & HT@808nm, T>95%(see coating 3-2 ) |
3)AR@1063 nm, R<0.1%(see coating 3-3 ) |
NLO結晶
BBO Nonlinear Crystals
代表的仕様及び許容値
Angle tolerance |
Δθ< ± 0.2°; Δφ< ±0.2° |
Dimension tolerance |
(W ± 0.1mm) x (H ± 0.1mm) x (L + 0.2mm/-0.1mm) |
Flatness |
<λ /8 @ 633nm |
Scratch/Dig code |
better than 10/5 Scracth/dig per MIL-O-13830A |
Parallelism |
< 20 arc seconds |
Perpendicularity |
<5 arc minutes |
Wavefront distortion |
<λ/8 @ 633nm |
Clear aperture |
> 90% central area |
Coating |
Protective Coating or Anti-Reflection |
KTP
代表的仕様及び許容値
Angle tolerance |
Δθ< ± 0.2°; Δφ< ±0.2° |
Dimension tolerance |
(W ± 0.1mm) x (H ± 0.1mm) x (L + 0.2mm/-0.1mm) |
Flatness |
λ/8 @ 633nm |
Scratch/Dig code |
better than 10/5 Scracth/dig per MIL-O-13830A |
Parallelism |
< 20 arc seconds |
Perpendicularity |
< 5 arc minutes |
Wavefront distortion |
< λ/8 @ 633nm |
Clear aperture |
> 90% central area |
複屈折性結晶
YVO4
物性数値
項目 |
数値 |
Transparency Range |
400~5000nm |
Crystal Symmetry |
Zircon tetragonal, space group D4h |
Crystal Cell |
A=b=7.12 °, c=6.29 ° |
Density |
4.22 g/cm 2 |
Hygroscopic Susceptibility |
Non-hygroscopic |
Mohs Hardness |
5 glass like |
Thermal Optical Coefficient |
dn a /dT=8.5×10 -6 /K; dn c /dT=3.0×10 -6 /K |
Thermal Conductivity Coefficient |
||C: 5.23 w/m/k; ⊥C:5.10w/m/k |
Crystal Class |
Positive uniaxial with no=na=nb, ne=nc |
Refractive Indices, Birefringence( D n=ne-no) and Walk-Off Angle at 45 deg(ρ) |
No=1.9929, ne=2.2154, D n=0.2225, ρ=6.04°, at 630nm |
No=1.9500, ne=2.1554, D n=0.2054, ρ=5.72°, at 1300nm |
No=1.9447, ne=2.1486, D n=0.2039, ρ=5.69°, at 1550nm |
Sellmeier Equation (λ in μm) |
n o 2 =3.77834+0.069736/(l2 -0.04724)-0.0108133l2 |
n e 2 =4.5909+0.110534/(l2 -0.04813)-0.0122676 l2 |
a-BBO
物性数値
項目 |
数値 |
Transparency Range |
189~3500nm |
Density |
3.85g/cm |
Therm-Optic Coefficients |
dno/dT= – 9.3×10 /°C |
dne/dT= – 16.6×10 /°C |
Optical Homogeneity |
Δn ≈ 10-6 /cm |
Mohs Hardness |
4.5 glass like |
Damage Threshold |
1GW/cm2 at 1064nm |
200MW/cm2 at 532nm |
Thermal Expansion Coefficients |
αa=4×10-6 /K |
(25°C~900°C) |
αc=36×10-6 /K |
Linear Absorption Coefficients |
a |
Refractive Indices |
ne=1.53797, no=1.65790,Δn= – 0.11993, ρ= – 4.9532°,at 1064nm |
Birefringence(Δn=ne – no) |
ne=1.55345, no=1.67755,Δn= – 0.12411, ρ= – 5.0407°,at 532nm |
and Walk-Off angle at 45°C(ρ) |
ne=1.61145, no=1.76171,Δn= – 0.15026, ρ= – 5.6926°,at 266nm |
Sellmeier equation (λ in μm) |
no2 = 2.7471+0.01878/(λ2 -0.01822)-0.01354λ2 |
ne 2 = 2.37153+0.01224/(λ2 -0.01667)-0.01516λ2 |
E-O結晶
BBO
製品 No. |
サイズ(mm) |
オリエンテーション |
コーティング |
BBO101 |
3x3x18 |
Z-Cut |
Z-face AR coating,X-face Au coating |
BBO102 |
3x3x20 |
Z-Cut |
Z-face AR coating,X-face Au coating |
KTP
Material |
Phase |
Amplitude |
– |
ε |
n |
r pm/V |
k 10 -6 /°C |
n 7 r 2 / ε (pm/V) 2 |
r pm/V |
k 10 -6 /°C |
n 7 r 2 / ε (pm/V) 2 |
KTP |
15.4 |
1.8 |
35 |
31 |
6130 |
27 |
11.7 |
3650 |
LiNbO 3 |
27.9 |
2.2 |
31 |
82 |
7410 |
20.1 |
42 |
3500 |
KD*P |
48 |
1.47 |
26.4 |
9 |
178 |
24 |
8 |
178 |
LiIO 3 |
5.9 |
1.47 |
6.4 |
24 |
335 |
1.2 |
15 |
124 |
光学結晶
YAG 結晶
基本物性
項目 |
数値 |
Crystal structure |
Cubic |
Density |
4.5g/cm 3 |
Transmission Range |
250-5000nm |
Melting Point |
1970°C |
Specific Heat |
0.59 W.s/g/K |
Thermal Conductivity |
14 W/m/K |
Thermal Shock Resistance |
790 W/m |
Thermal Expansion |
6.9×10 -6 /K |
dn/dt, @633nm |
7.3×10 -6 /K -1 |
Mohs Hardness |
8.5 |
Refractive Index |
1.8245 @0.8 m m, 1.8197 @1.0 m m, 1.8121 @1.4 m m |
サファイア結晶(AI2O3)
基本物性
項目 |
数値 |
Crystal structure |
Hexagonal System |
Lattice |
a=4.785?, C=12.991? |
Density |
3.98g/cm3 |
Transmission Range |
150-5500nm |
Melting Point
| 2040°C |
Specific Heat |
0.418 W.s/g/K |
Thermal Conductivity |
25.12 W/m/K |
Thermal Shock Resistance |
790 W/m |
Thermal Expansion Coefficient |
5.8×10 -6 /K |
dn/dt, @633nm |
13×10 -6 /K |
Mohs Hardness |
9 |
Refractive Index |
1.83 @0.26 mm, 1.76 @0.63 m m, 1.58 @5.57 mm |
結晶ホルダー
Part No. |
F C(mm) |
T(mm) |
クリスタルアパーチュア(mm) |
クリスタル長さ(mm) |
BH2001 |
25.4 |
5 |
4×4-10×10 |
0.1-2 |
BH2002A |
25.4 |
9.5 |
4×4-10×10 |
4-6 |
BH2003 |
25.4 |
9.5 |
8×8-10×10 |
2-4 |
BH2002B |
25.4 |
13.5 |
4×4-10×10 |
6-10 |
ポラライザー
Glan Taylorポラライザー
仕様
項目 |
数値 |
Material |
a -BBO, Calcite or YVO4 |
Wavelength Range |
a -BBO: 200-3500 nm, Calcite: 350-2300 nm, YVO4: 400-5000 nm |
Extinction Ratio |
Calcite |
Parallelism |
|
Surface Quality |
20-10 |
Beam Deviation
| < 3 arc minutes |
Wavefornt Distortion |
l/4@633nm |
Damage Threshold |
>200 MW/cm2 |
Coating |
Single Layer MgF2 |
Glan Laserポラライザー
仕様
項目 |
数値 |
Material |
a -BBO, Calcite or YVO4 |
Wavelength Range |
a -BBO: 200-3500 nm, Calcite: 350-2300 nm, YVO4: 400-5000 nm |
Extinction Ratio |
Calcite |
Parallelism |
|
Surface Quality |
10/20 |
Beam Deviation |
< 3 arc minutes |
Wavefornt Distortion |
l/4@633nm |
Damage Threshold |
>500 MW/cm 2 |
Coating |
Single MgF2 |
Mount |
Black Anodized Aluminium |
High Transmission Glan Laserポラライザー
仕様
項目 |
数値 |
Material |
Calcite or YVO4 |
Wavelength Range |
Calcite: 350-2300 nm, YVO4: 400-4000 nm |
Extinction Ratio |
Calcite |
Parallelism |
|
Surface Quality |
20-10 |
Beam Deviation |
< 3 arc minutes |
Wavefront Distortion |
l/4@633nm |
Damage Threshold |
>500 MW/cm 2 |
Coating |
Uncoated |
Transmission |
>95% |
Mount |
Black Anodized Aluminium |
Glan Thompsonポラライザー
仕様
項目 |
数値 |
Material
| a -BBO, Calcite |
Wavelength Range |
a -BBO: 220-1100 nm, Calcite: 350-2300 nm |
Extinction Ratio |
Calcite |
Parallelism
| |
Surface Quality |
20-10 |
Beam Deviation |
< 3 arc minutes |
Wavefornt Distortion |
l/3@633nm |
Damage Threshold |
>200 MW/cm 2 |
Coating |
Single MgF2 |
Mount |
Black Anodized Aluminium |
Wollastonポラライザー
仕様
項目 |
数値 |
Material |
a -BBO, Calcite, YVO4, Quartz |
Wavelength Range |
a -BBO:200-3500 nm,Calcite:350-2300 nm,YVO4:400-5000nm,Quartz:200-2300nm |
Extinction Ratio |
Calcite, Quartz |
Parallelism |
|
Surface Quality |
20-10 |
Beam Deviation |
< 3 arc minutes |
Wavefornt Distortion |
l/4@633nm |
Damage Threshold |
>500 MW/cm 2 |
Coating |
Single MgF2 |
Mount |
Black Anodized Aluminium |
Rochonポラライザー
仕様
項目 |
数値 |
Material |
a -BBO, MgF2, YVO4, Quartz |
Wavelength Range |
a -BBO:190-3500 nm, MgF2:130-4000nm,YVO4:400-4000nm,Quartz:200-2300nm |
Extinction Ratio |
Quartz |
Parallelism |
|
Surface Quality |
20-10 |
Beam Deviation |
< 3 arc minutes |
Wavefornt Distortion |
l/4@633nm |
Damage Threshold |
>500 MW/cm 2 |
Coating |
Single Layer MgF2 |
Mount |
Black Anodized Aluminium |
その他
High Power Polarization Cube BeamSplitter
仕様
項目 |
数値 |
Dimension Tolerance |
±0.2mm |
Flatness |
Lambda/4 @632.8nm |
Surface Quality |
60-40 scratch and dig |
Beam Deviation |
<3 arc minutes |
Extinction Ratio |
TP : TS > 1000:1 |
Principal Transmittance |
Tp>90% for Broadband |
Tp>95% for Narrowband |
Principal Reflectance |
Rs>99.5% |
Coating: Hypotenuse Face |
Polarization Beamsplitter Coating |
All Input and Output Faces |
AR Coating |
Principal Transmittance for 450~680nm |
Tp_avg>90%(Broadband) |
RGB Prism(Philips Prism)
項目 |
数値 |
Optical Path |
14~150 mm |
Clear Aperture |
up to 50x50mm |
Wavelength range |
430~670nm |
Antireflection coating |
R<0.4% |
Type of coating |
Dichroic |
Blue |
430~480 nm |
Green |
520~560 nm |
Red |
600~670 nm |
Transmission |
>80% |
Interface |
upon request |
Mount type |
upon request |
Output trimming filter |
upon request |
製品の販売実績
アカデミック
- 宇宙航空研究開発機構
- 横浜国立大学
- 核融合科学研究所
- 学習院大学
- 京都大学
- 情報通信研究機構
- 大阪大学
- 電気通信大学
- 東京工業大学
- 東京大学
- 東京農工大学
- 同志社大学
- 分子科学研究所
- 豊田工業大学
- 北海道大学
- 名古屋大学
- 理化学研究所
- 量子科学技術研究開発機構
企業
- ロボット開発メーカー
- 光通信用部品・測定器メーカー
- 光関連部品・測定器 専門商社
- センサーモジュールメーカー
- 半導体レーザーメーカー
- 精密光学機器専門商社
- コイルメーカー
- 計測器専門商社
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